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| June 3, 2009 12:57 PM EDT |
Submission Deadline is
The conference draws technical leaders from around the world to discuss leading-edge research in the field of advanced metallization and 3-D integration for ULSI IC applications. "The meeting provides a forum for open discussion of critical issues affecting state-of-the-art and future directions in interconnect systems. It's a great opportunity for collaboration on new cutting-edge research," said
Presentations must be original, non-commercial and non-published works, and focus on ULSI IC metallization and associated subjects such as ultra low-k dielectrics, scaling effects on resistance, diffusion barriers, metal/dielectric planarization emphasizing CMP, electrochemical and electroless deposition processes in advanced metallization, novel interconnect systems concepts such as vertical, optical and RF issues, chip interconnect/packaging interface including 3-D integration as well as metallization technologies for micro-system-technology and solar cell applications.
Abstracts of approximately 250 words are due by
Papers presented at the conference will be published by the Materials Research Society. In the past, the books resulting from this meeting have been very popular, and have found highest acceptance as information sources for advanced metallization.
A complete list of topic areas for papers is available at:
www.unex.berkeley.edu/eng/metal/call.html#topics.
For additional information, please contact: amc@unex.berkeley.edu; (510)
642-4151
SOURCE UC Berkeley Extension
Published June 3, 2009
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